EFEITO DE INDUTORES DE RESISTÊNCIA A BASE DE SILÍCIO, ÓXIDO NÍTRICO E ORGANOMINERAIS NO CRESCIMENTO E PRODUÇÃO DO FEIJOEIRO

Abstract

This research evaluated the effects of resistance inducers based on silicon, nitric oxide, and organominerals on the growth and productivity of common bean (Phaseolus vulgaris L.) cultivar IPR Urutau. The experiment was conducted in a randomized block design with five treatments: silicon (Si), nitric oxide (NO), a combination of Si+NO, Semia®, and a control, with four replications. Physiological parameters, including photosynthetic pigments (chlorophyll a, b, and total), chlorophyll fluorescence, dry matter, and yield, were analyzed. The results showed a reduction in the chlorophyll a:b ratio in all treatments except the control. Semia® demonstrated the highest increase in net photosynthesis and yield, while Si+NO resulted in the highest number of pods. No significant differences were observed in dry matter among treatments. It is concluded that resistance inducers are promising tools for enhancing photosynthetic efficiency and the productivity of common bean crops.